CRYSCORE polishes the sapphire wafers by special CMP (Chemical Mechanical Polishing) technology, which is a widely used planarization technology, and provides the customers with high surface quality sapphire wafers at low cost.
We carry a variety of standard sapphire wafers and sapphire substrates in stock to ensure a quick delivery. The wafers are cleaned in class 100 cleanroom by ultrapure water with quality above 18 MΩ *cm, and then packed in clean cassettes. 25 pcs a pack or single pack is available to maximize customer flexibility in their research.
Item | 2-inch C-plane(0001) 430μm Sapphire Wafers | |
Crystal Materials | 99,999%, High Purity, Monocrystalline Al2O3 | |
Grade | Prime, Epi-Ready | |
Surface Orientation | C-plane(0001) | |
C-plane off-angle toward M-axis 0.2 +/- 0.1° | ||
Diameter | 50.8 mm +/- 0.1 mm | |
Thickness | 430 μm +/- 25 μm | |
Primary Flat Orientation | A-plane(11-20) +/- 0.2° | |
Primary Flat Length | 16.0 mm +/- 1.0 mm | |
Single Side Polished | Front Surface | Epi-polished, Ra < 0.2 nm (by AFM) |
(SSP) | Back Surface | Fine ground, Ra = 0.8 μm to 1.2 μm |
Double Side Polished | Front Surface | Epi-polished, Ra < 0.2 nm (by AFM) |
(DSP) | Back Surface | Epi-polished, Ra < 0.2 nm (by AFM) |
TTV | < 10 μm | |
BOW | < 10 μm | |
WARP | < 10 μm | |
Cleaning / Packaging | Class 100 cleanroom cleaning and vacuum packaging, | |
25 pieces in one cassette packaging or single piece packaging. |
Note: Custom sapphire wafers with any orientation and any thickness can be provided.